کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1669323 | 1008882 | 2010 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Formation and transformation of ZnTiO3 prepared by sputtering process
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Formation and transformation of ZnTiO3 prepared by sputtering process Formation and transformation of ZnTiO3 prepared by sputtering process](/preview/png/1669323.png)
چکیده انگلیسی
Zinc titanate (ZnTiO3) films were prepared using RF magnetron sputtering at substrate temperatures ranging from 30 to 400 °C. Subsequent annealing of the as-deposited films was performed at temperatures ranging from 600 to 900 °C. It was found that all as-deposited films were amorphous, as confirmed by XRD. This was further confirmed by the onset of crystallization that took place at annealing temperatures 600 °C. The phase transformation for the as-deposited films and annealed films were investigated in this study. The results revealed that pure ZnTiO3 (hexagonal phase) can exist, and was obtained at temperatures between 700 and 800 °C. However, it was found that decomposition from hexagonal ZnTiO3 to cubic Zn2TiO4 and rutile TiO2 took place with a further increase in temperature to 900 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 24, 1 October 2010, Pages 7366-7371
Journal: Thin Solid Films - Volume 518, Issue 24, 1 October 2010, Pages 7366-7371
نویسندگان
Ying-Chieh Lee, Yen-Lin Huang, Wen-His Lee, Fuh-Sheng Shieu,