کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1670825 | 1008905 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Difference of deposition process of an amorphous carbon film due to source gases
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
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چکیده انگلیسی
We compared the deposition process of an amorphous carbon film using acetylene as a source gas with the deposition process using methane. The process was investigated by using infrared absorption spectroscopy in multiple internal reflection geometry (MIR-IRAS). The infrared spectra showed that sp3-hydrocarbon species was observed in both cases: on the other hand, the sp- and sp2-carbon and/or hydrocarbon species was clearly observed in the film deposited using acetylene. Moreover, we observed the changes in predominant adsorbed species with film thickness in both cases; these facts suggest that an amorphous carbon film grows with the structural changes of adsorbed species in both deposition processes.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 518, Issue 13, 30 April 2010, Pages 3497–3501
Journal: Thin Solid Films - Volume 518, Issue 13, 30 April 2010, Pages 3497–3501
نویسندگان
Masanori Shinohara, Hiroki Kawazoe, Takanori Inayoshi, Taka-aki Kawakami, Yoshinobu Matsuda, Hiroshi Fujiyama, Yuki Nitta, Tatsuyuki Nakatani,