کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1671465 1008917 2009 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Analysis and simulation of the post-breakdown leakage current in electrically stressed TiO2/SiO2 gate stacks
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Analysis and simulation of the post-breakdown leakage current in electrically stressed TiO2/SiO2 gate stacks
چکیده انگلیسی

The post-breakdown leakage current in electrically stressed metal-oxide-semiconductor structures with thin stacked layers of titanium dioxide (TiO2) over silicon dioxide (SiO2) was investigated. The samples were obtained by plasma oxidation at room temperature. Multiple dielectric breakdowns were induced by the application of successive high-field voltage ramps. The resulting current–voltage characteristics were simulated using an equivalent electrical circuit model consisting in a diode with series and parallel resistances, which is solved using the Lambert W function. We show that after the first breakdown event the current that flows through the non-damaged gate stack area may still play a major role in determining the shape of the post-breakdown current–voltage characteristic. Similarities and differences with previous studied systems are discussed.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 517, Issue 5, 1 January 2009, Pages 1710–1714
نویسندگان
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