کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1671472 | 1008917 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
In this study, Ta2O5–SiO2 composite films with various proportions of Ta2O5 were prepared by radio frequency ion-beam sputtering deposition. The residual stress of each composite film was analyzed. The residual stresses of different graded-index-like layers made of composite films were studied. The results show that the residual stress of a single layered composite film was lower than that of pure SiO2 or a pure Ta2O5 film. Furthermore, when the composite film was made graded-index-like, the residual stress was reduced.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 517, Issue 5, 1 January 2009, Pages 1746–1749
Journal: Thin Solid Films - Volume 517, Issue 5, 1 January 2009, Pages 1746–1749
نویسندگان
Chien-Jen Tang, Cheng-Chung Jaing, Kai Wu, Cheng-Chung Lee,