کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1671472 1008917 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering
چکیده انگلیسی

In this study, Ta2O5–SiO2 composite films with various proportions of Ta2O5 were prepared by radio frequency ion-beam sputtering deposition. The residual stress of each composite film was analyzed. The residual stresses of different graded-index-like layers made of composite films were studied. The results show that the residual stress of a single layered composite film was lower than that of pure SiO2 or a pure Ta2O5 film. Furthermore, when the composite film was made graded-index-like, the residual stress was reduced.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 517, Issue 5, 1 January 2009, Pages 1746–1749
نویسندگان
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