کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1671604 1008920 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
PLD growth of CuAlO2
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
PLD growth of CuAlO2
چکیده انگلیسی

Copper aluminium oxide, CuAlO2 (“CAO”) films were deposited by pulsed laser deposition (“PLD”) on a variety of substrates. As-deposited films were X-ray amorphous. Films formed at 200 °C were insulating, whereas films formed on sapphire at 720 °C were conducting. Specific conductivity and light transmittance were optimized for CAO/sapphire. Best values for the conductivity of around 0.3 S/cm for 280 nm thick films on sapphire were obtained for 3.5 J/cm2/pulse, substrate to target distance 6.5 cm, 400 mTorr oxygen and 720 °C, deposition time 90 min at 10 Hz. Films obtained under these conditions were specular and had a refractive index around 2.1 as derived from reflectivity measurements. Transmission spectra showed an onset around 400 nm and a non-negligible unspecific absorption above.Annealing of as-deposited, X-ray amorphous films on sapphire at 1050 °C in air for 5 min led to crystallization in combination with disruption of film continuity (and therefore loss of conductivity) as seen by optical microscopy, where hexagonal platelets could be clearly distinguished. X-ray analysis showed highly preferential orientation (<003>, <006>, <009>, <0012>). Post-annealing in situ (15 min–8 h) at 720 °C had no effect on film properties.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 24, 15 October 2007, Pages 8641–8644
نویسندگان
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