Pulsed laser ablated off-stoichiometric thin films of the Heusler alloy Co2TiSn on Si (100) substrate

We report the growth of thin films of ferromagnetic Heusler alloy Co2TiSn on Si (100) substrate using KrF excimer pulsed laser ablation. Films of thicknesses ranging from 8 to 220 nm were deposited on Si (100) substrate heated up to 200 ± 10 °C, with an aim to study the structural, morphological and magnetic properties. The grown films are off-stoichiometric, polycrystalline, having single-phase with high degree of (220) texturing. Angle dependent fluorescence measurements suggest no segregation of alloying elements as a function of depth. X-ray reflectivity measurements indicate that all the films are having low density layer at the top as well as at the film-substrate interface. Magneto optical Kerr effect measurements at room temperature reveal clear hysteresis loops suggesting ferromagnetic behavior of the films. Thermal annealing at temperature ≥ 220 °C suggest transformation of Co2TiSn phase into cobalt silicide phase, which confirms the necessity of low substrate temperature (< 220 °C) to produce such single-phase Co2TiSn films.