Influence of substrate type on surface structure of polymeric perfluorocarbon in the initial stage of deposition in Ar/c-C4F8 plasmas

Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C4F8 plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.