کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1672497 | 1008934 | 2009 | 4 صفحه PDF | دانلود رایگان |
In this paper, the silicon nanocrystals (Si NCs)/SiO2 hybrid films designed for nonvolatile memory applications are prepared by electron-beam co-evaporation of Si and SiO2. Transmission electron microscopy images and Raman spectra verify the formation of Si NCs. Metal-oxide-semiconductor capacitor structure with Si NCs embedded in the gate oxide is fabricated to characterize the memory behaviors. High-frequency capacitance–voltage and capacitance–time measurements further demonstrate the memory effect of the structure resulting from the charging or discharging behaviors of Si NCs. It is found that the memory window can be changed by adjusting the Si/SiO2 wt. ratio in source material. The memory devices with Si NCs/SiO2 hybrid film as floating gate yield good retention characteristics with small charge loss.
Journal: Thin Solid Films - Volume 517, Issue 24, 30 October 2009, Pages 6659–6662