کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1672636 1008937 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Sputter-assisted plasma CVD of polymer-like amorphous CNx:H films using supermagnetron plasma
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Sputter-assisted plasma CVD of polymer-like amorphous CNx:H films using supermagnetron plasma
چکیده انگلیسی

By using a sputter-assisted chemical vapor deposition (CVD) of supermagnetron plasma, amorphous CNx:H films were deposited on the lower part of two parallel electrodes. By applying rf power to the upper electrode (UPRF) at 5 W to 800 W, polymer-like a-CNx:H films were deposited on substrates placed on the lower electrode with an rf power (LORF) of 10 W. The deposition rate increased as UPRF increased. The hardness was as low as about 6.5 GPa, which is less than that of glass (13.1 GPa). The refractive index changed only slightly as UPRF changed from 1.6 to 1.75. The FT-IR spectrum showed strong absorption bands of NH and CH bonds at high and low UPRFs, respectively. The optical band gap was as large as 2.1 to 2.5, and it decreased as UPRF increased. These a-CNx:H films showed white photoluminescence (PL) with broadband. With the increase of UPRF from 5 W to 800 W, the PL peak energy shifted down from 2.3 eV to 1.9 eV.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 9, 12 March 2007, Pages 4121–4124
نویسندگان
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