Fabrication of ferromagnetic Ni epitaxial thin film by way of hydrogen reduction of NiO

The ferromagnetic epitaxial Ni (111) thin film on the oxide substrate could be obtained by an epitaxy method, employing pulsed laser deposition (PLD) of epitaxial NiO (111) film on the sapphire (α-Al2O3) substrate and successive hydrogen reduction. The epitaxial NiO (111) film was deposited on the sapphire (0001) substrate at room temperature by PLD, and was reduced into the Ni epitaxial film by annealing (300 °C to 700 °C) in the hydrogen atmosphere, suggesting the possible formation of epitaxial [Ni metal/α-Al2O3] multilayer. The epitaxy of Ni film was proved by ex situ X-ray diffraction. The ferromagnetic anisotropy of the epitaxial Ni film was examined by superconducting quantum interference magnetometry.