Low resistive diamond like carbon film development technique

Low-temperature plasma-enhanced diamond like carbon (DLC) film chemical deposition technique is developed. Emission spectra of plasma is digitized and processed for deposition process control. Electric field – transversely applied to plasma stream – permits to obtain coatings with predefined properties. The influence of this field on plasma characteristics and hence – on the properties of deposited coatings is studied. The specific resistance of nitrogen doped, hydrogenised DLC films could be varied from typically isolators down to ~ 10− 4 Ohm cm. The coatings were of n-type. Mobility of major carriers approaches up to 40 cm2V− 1s− 1 depending on the technological parameters. Obtained films were durable, transparent and have high refractive index reaching up to 3.1.