کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1674128 | 1008957 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Analysis of threshold voltage shift of pentacene field effect transistor with ferroelectric gate insulator as a Maxwell–Wagner effect
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The current–voltage (I–V) characteristics of pentacene filed effect transistor (FET) with ferroelectric gate insulator (P(VDF-TeFE)) is investigated to analyze the threshold voltage shift in terms of Maxwell–Wagner (MW) effect. The spontaneous polarization generated in ferroelectric gate insulator modulates the amount of accumulated charges which is injected from the source electrode, and causes threshold voltage shift. Two peaks observed in the I–V characteristics were analyzed based on a MW effect element. Results reveal that the movement of accumulated charges at the pentacene/P(VDF-TeFE) interface along the electric field in the FET, and the ferroelectric polarization of P(VDF-TeFE) are main origins of the peaks.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 516, Issue 9, 3 March 2008, Pages 2753–2757
Journal: Thin Solid Films - Volume 516, Issue 9, 3 March 2008, Pages 2753–2757
نویسندگان
Ryousuke Tamura, Eunju Lim, Shuhei Yoshita, Takaaki Manaka, Mitsumasa Iwamoto,