کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1674513 1008965 2007 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication of high performance low temperature poly-silicon backplanes on metal foil for flexible active-matrix organic light emission diode displays
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Fabrication of high performance low temperature poly-silicon backplanes on metal foil for flexible active-matrix organic light emission diode displays
چکیده انگلیسی

We have developed Low Temperature Poly-Silicon (LTPS) backplanes on metal for flexible 2.8-in. Active-Matrix Organic Light Emission Diode (AM-OLED) displays. The PMOS devices exhibit interesting characteristics such as field-effect mobility of 83 cm2/V.s, on/off current ratio of more than 107, a substhreshold slope of 0.47 V/dec, and a leakage current of 0.02 pA/μm at Vds = 0.1 V. Also, thin film transistors (TFT) characteristics were shown to be very homogeneous across the plates. These good performances are attributed to the possibility of developing an LTPS process on metal very close to the process existing on glass, thanks to the use of plasma enhanced chemical vapour deposition (PECVD) SiO2 as the thick insulator, which provides to maintain high temperature budget. The influence of the metal substrate as a back-gate was studied as a function of the insulator thickness. Based on simulation and measurements, it was evidenced that the metal potential can have a significant influence on the TFT operation. Overall, this self-aligned LTPS process on metal seems to be very promising for the manufacturing of high quality and high resolution flexible AM-OLED displays.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 19, 16 July 2007, Pages 7428–7432
نویسندگان
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