کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1675030 | 1008973 | 2006 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Noncontact characterization of sheet resistance of indium–tin-oxide thin films by using a near-field microwave microprobe
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The sheet resistance of indium–tin-oxide (ITO) thin films with different microstructures and morphologies was measured by using a near-field scanning microwave microprobe (NSMM). The NSMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f = 5.2–5.5 GHz. ITO thin films with different microstructures and morphology were characterized by X-ray diffraction and atomic force microscopy. As the sheet resistance increased, the intensity ratio of the (222) to the (400) diffraction peak increased and the surface roughness increased.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 515, Issue 4, 5 December 2006, Pages 1354–1357
Journal: Thin Solid Films - Volume 515, Issue 4, 5 December 2006, Pages 1354–1357
نویسندگان
Soonil Yun, Sunguk Na, Arsen Babajayan, Hyunjung Kim, Barry Friedman, Kiejin Lee,