کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1675924 | 1518088 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
In situ observation of heteroepitaxial β-FeSi2 during electron-beam irradiation
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: In situ observation of heteroepitaxial β-FeSi2 during electron-beam irradiation In situ observation of heteroepitaxial β-FeSi2 during electron-beam irradiation](/preview/png/1675924.png)
چکیده انگلیسی
The effect of electron-beam irradiation on the microstructural characterization of β-FeSi2 thin film has been studied at room temperature by in situ transmission electron microscopy. Analysis of the captured video images reveals that significant changes occur in the microstructure of the heteroepitaxial phase during the irradiation. For heteroepitaxial layers with ultrathin thickness below 20 monolayers, the Moiré fringe direction was observed to deviate from its original orientation and the islands often shrink and disappear under the electron-beam irradiation. These observations have significant implications for the microstructural characterization of ultrathin epitaxial films using transmission electron microscopy.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 514, Issues 1–2, 30 August 2006, Pages 58–62
Journal: Thin Solid Films - Volume 514, Issues 1–2, 30 August 2006, Pages 58–62
نویسندگان
M. Han, J.C. Bennett, Q. Zhang, M. Tanaka, M. Takeguchi, K. Furuya,