کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1675930 | 1518088 | 2006 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
An infrared study of the surface chemistry of titanium nitride atomic layer deposition on silica from TiCl4 and NH3
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: An infrared study of the surface chemistry of titanium nitride atomic layer deposition on silica from TiCl4 and NH3 An infrared study of the surface chemistry of titanium nitride atomic layer deposition on silica from TiCl4 and NH3](/preview/png/1675930.png)
چکیده انگلیسی
The initial stages of titanium nitride atomic layer deposition using sequential additions of TiCl4 and NH3 on fumed silica powder were investigated using in situ Fourier transform infrared spectroscopy techniques. After the first stage, the primary active surface species for the formation of TiN were determined to be TiClx and Ti2NH. After six complete atomic layer deposition cycles the infrared spectrum indicated a strong TiN band that was verified by diffuse reflectance infrared spectroscopy recorded on pure TiN powder. Incomplete surface reactions were also observed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 514, Issues 1–2, 30 August 2006, Pages 97–102
Journal: Thin Solid Films - Volume 514, Issues 1–2, 30 August 2006, Pages 97–102
نویسندگان
Mark Q. Snyder, Benjamin A. McCool, Joseph DiCarlo, Carl P. Tripp, William J. DeSisto,