کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1676001 1518089 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Improvement of electrical stability of polycrystalline ZnO thin films via intentional post-deposition hydrogen doping
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Improvement of electrical stability of polycrystalline ZnO thin films via intentional post-deposition hydrogen doping
چکیده انگلیسی
We investigate the hydrogen doping effect on polycrystalline ZnO thin films prepared by the photoassisted metalorganic chemical vapor deposition technique. In situ post-deposition hydrogen doping was performed using mercury-sensitized photodecomposition of hydrogen gas. From Fourier transform infrared spectra, we observe small changes in O-H bond-stretching local vibrational modes as a result of hydrogen doping. The photoluminescence measurements reveal that intentional hydrogen doping significantly suppresses nonradiative recombination centers in the ZnO films. The undoped ZnO film reveals a heavily n-type as-grown conductivity due to the high hydrogen content, but it is unstable in a humid air atmosphere. However, the electrical stability is significantly improved as a result of hydrogen doping.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 513, Issues 1–2, 14 August 2006, Pages 148-151
نویسندگان
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