Development of catalytic chemical vapor deposition apparatus for large size substrates

A Cat-CVD (catalytic chemical vapor deposition, Hot-Wire CVD) apparatus for deposition of large area substrates is developed. Technical issues for a large area deposition apparatus are pointed out and the way to solve such issues is demonstrated, along with deposition performance. It is shown that a large area deposition apparatus as a prototype of future mass-production machine is realized by using the Cat-CVD technology.