Consecutively spin-assembled layered nanoarchitectures of poly(sodium 4-styrene sulfonate) and poly(allylamine hydrochloride)

The recently established spin-coating electrostatic self-assembly (SCESA) technique has been shown to facilitate not only the rapid fabrication of polyelectrolyte multilayer assemblies, but also allow each layer to be easily controlled on a monomolecular scale by minimizing the film thickness across a substrate surface. In this paper, the influence of polyelectrolyte concentration on the amount and thickness of spin-deposited polymer films has been examined for a multilayer system of poly(allyamine hydrochloride) (PAH) and poly(sodium 4-styrenesulfonate) (PSS), when the washing steps employed for removing weakly bound polyelectrolytes on a resultant film on a substrate are excluded from the standard fabrication procedure of the SCESA method. The thickness of the spin-deposited PAH/PSS bilayer increased linearly for the PSS concentrations in the range from 1 to 10 mM with PAH constant at 1 mM, which demonstrates the uniform deposition of each layer material onto the thin film. The thickness of PAH/PSS bilayers increased from 1.43 ± 0.06 to 3.37 ± 0.08 nm as the PSS concentration increased from 1 to 10 mM, while the PAH concentration was kept constant at 1 mM. The multilayer films were found to be stable in a good solvent (H2O) for at least 30 h, without any noticeable loss of the adsorbed layer component of the polyelectrolyte. This improvement to the SCESA method (exclusion of washing steps) provides a convenient way to create multilayer heterostructures with the thickness of each layer being easily adjusted.