کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1676624 | 1009005 | 2006 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Atomic layer deposition and post-deposition annealing of PbTiO3 thin films
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Atomic layer deposition and post-deposition annealing of PbTiO3 thin films Atomic layer deposition and post-deposition annealing of PbTiO3 thin films](/preview/png/1676624.png)
چکیده انگلیسی
Lead titanate thin films were deposited by atomic layer deposition on Si(100) using Ph4Pb and Ti(O-i-Pr)4 as metal precursors and O3 and H2O as oxygen sources. The influence of the Ti : Pb precursor pulsing ratio on the film growth, stoichiometry and quality was studied at two different temperatures, i.e. 250 and 300 °C. Uniform and stoichiometric films were obtained using a Ti : Pb precursor pulsing ratio of 1 : 10 at 250 °C or 1 : 28 at 300 °C. The as-deposited films were amorphous but the crystalline PbTiO3 phase was obtained by rapid thermal annealing at 600–900 °C both in N2 and O2 ambient. Thin PbTiO3 films were visually uniform and roughness values for as-deposited and annealed films were observed by atomic force microscopy.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 496, Issue 2, 21 February 2006, Pages 346–352
Journal: Thin Solid Films - Volume 496, Issue 2, 21 February 2006, Pages 346–352
نویسندگان
Jenni Harjuoja, Anne Kosola, Matti Putkonen, Lauri Niinistö,