کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1676957 1518094 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Magnetron plasma-enhanced chemical vapor deposition of diamond-like carbon thin films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Magnetron plasma-enhanced chemical vapor deposition of diamond-like carbon thin films
چکیده انگلیسی

An RF magnetron plasma-enhanced chemical vapor deposition system with variable magnetic field (MagPECVD) was utilized for high rate deposition of diamond-like carbon thin films. Deposition rate was nonuniform, with minimum value of 30 nm/min in the center of the cathode where the low ionic flux is determined by the absence of the E × B electronic drift. The highest value of 1029 nm/min was registered in the position of the cathode with the highest ion flux determined by the presence of the E × B electronic drift. Hardness, elastic modulus and RMS roughness of thin films were dependent on local values of magnetic field intensities and the values of input power.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volumes 506–507, 26 May 2006, Pages 63–67
نویسندگان
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