کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1676982 1518094 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Synthesis and characterization of plasma-polymerized hexamethyldisiloxane films
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Synthesis and characterization of plasma-polymerized hexamethyldisiloxane films
چکیده انگلیسی

The deposition rates of plasma-polymerized (pp-) films from hexamethyldisiloxane (HMDSO) monomer were determined by the quartz crystal microbalance technique. Using the several polymerization conditions for HMDSO, these were found that the deposition rates were proportional to the polymerization time. The deposition rate of the pp-HMDSO films increased with the increasing RF power. But for vapor pressure, the deposition rates increased with increasing the vapor pressure until 100 Pa; above it, deposition rates tended to decrease gradually. The maximum deposition rate of pp-HMDSO film was obtained 4.577 μg/min on 150 W of RF power at 100 Pa of monomer pressure.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volumes 506–507, 26 May 2006, Pages 176–179
نویسندگان
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