کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1676989 | 1518094 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth responses of ultrathin CNx overcoats to process parameters
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Ultrathin CNx overcoats were grown using pulsed dc magnetron sputtering. Substrates were mounted on a holder that allowed 45° tilt angle and rotation. Effects of process parameters on film growth were reviewed. AFM scans over large sampling areas show that thin CNx films obtained at â 100 V substrate bias with 45° substrate tilt and 20-25 rpm rotation have r.m.s. roughness about 0.2-0.3 nm when sampled over 20 Ã 20 μm2 areas, increasing to â¼Â 0.45 nm when sampled over â¼Â 0.05 Ã 3 cm2 using X-ray reflectivity measurements. These 1-2 nm thick ultrasmooth coatings reduced corrosion damage compared with coatings of the same thickness grown without substrate tilt and rotation. This improved performance is likely a result of more efficient and uniform momentum transfer parallel to the surface during deposition in this configuration. In addition, detailed X-ray reflectivity measurements showed that the mass density of these CNx films is â¼Â 2.0 g/cm3, independent of film thickness from â¼Â 1 to 10 nm, consistent with ion beam analysis.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volumes 506â507, 26 May 2006, Pages 207-211
Journal: Thin Solid Films - Volumes 506â507, 26 May 2006, Pages 207-211
نویسندگان
D.J. Li, Yip-Wah Chung,