کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1677054 | 1518097 | 2006 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The oxidation kinetics of nickel thin films studied by spectroscopic ellipsometry
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Thin nickel films deposited by d.c. magnetron sputtering on glass substrates were thermally annealed in air at temperatures in the range of 380–530 °C. The annealed samples were analyzed by ex situ spectroscopic ellipsometry. X-ray diffraction data reveal that during the oxidation process only the Ni and NiO phases are present. Thus, using an appropriate model that describes the ellipsometric spectra, the thickness of the NiO layer was obtained as a function of annealing temperature with an activation energy of 1.74 eV. Furthermore, a parabolic kinetics was found for the NiO thickness dependence on annealing time.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 503, Issues 1–2, 1 May 2006, Pages 40–44
Journal: Thin Solid Films - Volume 503, Issues 1–2, 1 May 2006, Pages 40–44
نویسندگان
A.M. López-Beltrán, A. Mendoza-Galván,