کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1677117 1518102 2006 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Quantum chemical study on the gas-phase reaction of tertiarybutylhydrazine: A potential nitrogen-bearing compound for GaN film growth
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Quantum chemical study on the gas-phase reaction of tertiarybutylhydrazine: A potential nitrogen-bearing compound for GaN film growth
چکیده انگلیسی
Quantum chemical calculations of the gas-phase reactions of tertiarybutylhydrazine ((CH3)3CNHNH2) were performed to understand the possible reaction path when used as a nitrogen source for gallium nitride film growth. Thermochemical prediction using density functional theory showed that the reaction to form hydrazine (N2H4) and isobutene ((CH3)2CCH2) through β-hydride elimination in the tertiarybutyl ligand has the lowest activation energy barrier of 63 kcal/mol. In addition, rate constants calculations using transition-state theory also showed that the β-hydride elimination reaction predominated over all other gas-phase reaction paths. The calculated thermochemical and kinetic results agreed very well with the reported pyrolysis data.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 498, Issues 1–2, 1 March 2006, Pages 100-107
نویسندگان
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