کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1677144 1518102 2006 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication of nickel oxide and Ni-doped indium tin oxide thin films using pyrosol process
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Fabrication of nickel oxide and Ni-doped indium tin oxide thin films using pyrosol process
چکیده انگلیسی

Organic light emitting diodes (OLEDs) need indium tin oxide (ITO) anodes with highly smooth surface. The work function of ITO, about 4.8 eV, is generally rather lower than the optimum level for application to OLEDs. In this work, NiO was deposited by pyrosol process on pyrosol ITO film to increase the work function of the ITO for improving the performance of OLEDs. It was confirmed that NiO was successfully deposited on pyrosol ITO film and the NiO deposition increased the work function of pyrosol ITO, using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM) and atmospheric photoelectron spectroscopy. Furthermore, doping ITO with Ni succeeded in producing the Ni-doped ITO film with high work function and lower sheet resistance.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 498, Issues 1–2, 1 March 2006, Pages 240–243
نویسندگان
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