کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1677173 1518105 2006 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Combinatorial deposition of EL phosphor thin films by r.f. magnetron sputtering using a subdivided powder target
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Combinatorial deposition of EL phosphor thin films by r.f. magnetron sputtering using a subdivided powder target
چکیده انگلیسی

A new technique incorporating combinatorial deposition by r.f. magnetron sputtering was used to develop new Eu-activated multicomponent oxynitride thin-film phosphors for electroluminescence. By sputtering with a powder target that is subdivided into two parts, phosphor thin films with a chemical composition that varied across the substrate surface could be successfully prepared. Thin-film electroluminescent (TFEL) devices were fabricated incorporating various Eu-activated phosphor host materials such as multicomponent oxynitrides: GaN, AlN or Si3N4 combined with Ga2O3, CaO or ZnO. In ((AlN)1−X–(CaO)X):Eu thin films, for example, the chemical composition (CaO content (X)) could be optimized to obtain higher electroluminescent and photoluminescent emission intensities by using only one deposition with the new technique. As a result, a luminance of 170 cd/m2 for red emission was obtained in an ((AlN)0.1–(CaO)0.9):Eu TFEL device driven at 1 kHz. High luminances were also obtained in red-emitting-TFEL devices using either a ((GaN)0.9–(Ga2O3)0.1):Eu or a ((GaN)0.8–(ZnO)0.2):Eu thin film prepared with an optimized composition.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 494, Issues 1–2, 3 January 2006, Pages 33–37
نویسندگان
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