کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5466414 | 1517991 | 2017 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The influence of pulse plating frequency and duty cycle on the microstructure and stress state of electroplated copper films
ترجمه فارسی عنوان
تأثیر فرکانس پالس و چرخه کار بر روی ریزساختار و وضعیت تنش های فیلم های الکترولیتی مس
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
فلز مس، ریز ساختار، الکترود دوقلوها، فشار،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
In this work, the impact of pulse electroplating parameters on the cross-sectional and surface microstructures of blanket copper films were studied using electron backscattering diffraction and x-ray diffraction. The films evaluated were highly (111) textured in the direction perpendicular to the film surface. The degree of preferential orientation was found to decrease with longer pulse on-times, due to strain energy density driven growth of other grain orientations. Residual biaxial stresses were also measured in the films and higher pulse frequencies during deposition led to smaller biaxial stresses in the films. Film stress was also found to correlate with the amount of twinning in the copper film cross-sections. This has been attributed to the twins' thermal stability and mechanical properties.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 621, 1 January 2017, Pages 91-97
Journal: Thin Solid Films - Volume 621, 1 January 2017, Pages 91-97
نویسندگان
James B. Marro, Taghi Darroudi, Chukwudi A. Okoro, Yaw S. Obeng, Kathleen C. Richardson,