Comprehensive analysis of Subthreshold short channel behavior of a Dual-material gate strained trapezoidal FinFET

The current research highlights the subthreshold short channel characteristics of a novel structure namely Dual-material gate strained Trapezoidal strained FinFET. Based on the effective channel width and equivalent number of gates (ENG), we have developed a quasi-3-D scaling length model and examined device characteristics like potential and electric field. The response of the device towards the various short channel effects has also been studied in depth. The analytical results obtained have been verified using 3-D numerical device simulation results.