کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8032575 1517955 2018 27 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Transfer-free chemical vapor deposition of graphene on silicon substrate at atmospheric pressure: A sacrificial catalyst
ترجمه فارسی عنوان
تخمیر بخار شیمیایی بدون انتقال بدون استفاده از گرافن در بستر سیلیکون در فشار اتمسفر: یک کاتالیزور قربانی
کلمات کلیدی
گرافن، کاتالیزور مقدس، رسوب آزاد، مقاومت ورق، بازتاب
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Transfer-free synthesis of graphene on dielectric substrates is highly desirable, but remains challenging. Here, using a thin sacrificial platinum (Pt) layer as a catalyst, graphene was deposited on silicon (Si) substrate through a simple and transfer-free synthesis method. During graphene growth, the Pt layer evaporated, resulting in direct deposition of graphene on the Si substrate. In this work, different growth conditions of graphene were optimized. Raman spectra of the produced graphene indicated that the obtained graphene was bilayer. The sheet resistance obtained from four-point probe measurements demonstrated that the deposited graphene had high conductivity. Reflectance spectroscopy of graphene-coated Si showed a decrease in reflectance across the wavelength range of 200-800 nm, indicating that the graphene coating on the Si surface had antireflective capabilities.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 657, 1 July 2018, Pages 55-60
نویسندگان
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