کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8032673 1517958 2018 11 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Impacts of substrate bias and dilution gas on the properties of Si-incorporated diamond-like carbon films by plasma deposition using organosilane as a Si source
ترجمه فارسی عنوان
اثرات تعصب سوبسترا و گاز رقیق شده بر خواص فیبر کربن مانند الماس مانند کریستالی توسط رسوب پلاسما با استفاده از ارگانوسیلان به عنوان منبع سی
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
We have deposited silicon-incorporated diamond-like carbon (Si-DLC) films by plasma-enhanced chemical vapor deposition using monomethylsilane (CH3SiH3; MMS) as a Si source, and systematically investigated the impacts of substrate bias and dilution gas on the mechanical and tribological properties of the Si-DLC films. The use of a pulse bias and hydrogen dilution is very effective in suppressing the generation of particles during the deposition. The internal stress of the Si-DLC films deposited using the pulse bias tended to be lower than that of the Si-DLC films deposited using a DC bias, while the hydrogen dilution resulted in the increase in the internal stress. On the other hand, the Si-DLC film deposited with H2 using the pulse bias showed the highest adhesion strength and the lowest friction coefficient. The use of the pulse bias resulted in the increase in the wear resistance.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 654, 31 May 2018, Pages 38-48
نویسندگان
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