کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8033819 1518015 2015 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Pulsed laser ablation and deposition of ZnS:Cr
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Pulsed laser ablation and deposition of ZnS:Cr
چکیده انگلیسی
We present a method to deposit films with a range of doping concentrations/dilute alloys, from a single target in pulsed laser deposition (PLD). Cr-doped ZnS films were deposited by ablating a target consisting Cr particles (diameter 20-100 μm) embedded in a ZnS:Cr matrix. The Cr content in the film was varied in the range 2.0-5.0 at.% simply by varying the laser fluence, or by varying the number of pre-ablation pulses. Such a doping/composition range is normally not achieved using a single target in PLD. Details of the target ablation study, which is needed prior to the deposition, are also presented.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 590, 1 September 2015, Pages 28-32
نویسندگان
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