کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8034964 1518040 2014 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structural transformation and functional properties of vanadium oxide films after low-temperature annealing
ترجمه فارسی عنوان
تغییرات ساختاری و خواص عملکردی فیلمهای اکسید وانادیوم پس از خنک شدن دمای پایین
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
A two-step method is offered for the synthesis of vanadium oxide films to purposely change their functional properties. Vanadium oxide films were deposited on glass and silicon substrates by using magnetron sputtering of the vanadium target at various substrate temperatures (180-500 °C). During deposition, the substrate temperature predetermines structural and functional properties of the films after their following low-temperature (250-350 °C) annealing. In the films deposited at low substrate temperatures (200-220 °C), after low-temperature annealing there formed are flat crystallites of vanadium dioxide with lateral sizes 1 to 2 μm, which provides a high thermochromic effect. In the films deposited at temperatures of 250-300 °C, during the following low-temperature annealing the microcrystalline mixture of different vanadium oxides (50-150 nm) is formed, which provides a high value of the thermal coefficient of resistance for these films (7%/K). The low temperature annealing practically does not change the properties of films deposited at temperatures of 450-500 °C.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 564, 1 August 2014, Pages 179-185
نویسندگان
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