کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8035147 | 1518048 | 2014 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Influence of ethanol content in the precursor solution on anodic electrodeposited CeO2 thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Influence of ethanol content in the precursor solution on anodic electrodeposited CeO2 thin films Influence of ethanol content in the precursor solution on anodic electrodeposited CeO2 thin films](/preview/png/8035147.png)
چکیده انگلیسی
Ceria thin films have been anodically deposited onto 316L stainless steel in bath solutions containing different volume ratios of ethanol (0, 10, 40, 70 and 100% v/v). The influence of ethanol content on the electroplating behavior, and the structural and corrosion properties of the cerium oxide films were studied with electrochemical impedance spectroscopy, scanning electron microscopy, ellipsometry, X-ray diffraction, and Raman and X-ray photoelectron spectroscopy. Results show that ethanol content plays a significant role on the properties of the deposited ceria films but negligible effect on their electroplating behavior. The as-deposited films are mostly in the Ce(IV) oxidation state and the stoichiometry is around CeO1.90 for all samples. With the increase of ethanol content from 0 to 100% v/v, the average grain diameter and film thickness of the obtained ceria film decrease from 16.8 nm to 11.1 nm and from 32.9 nm to 15.8 nm, respectively. Using a deposition bath solution containing 10% v/v ethanol, a layer of compacted yellowish gold ceria film with the minimum porosity of 19.9%, mean crystalline diameter of 15.4 nm, and maximum corrosion resistance of 3.31 Ã 10â 5 Ω has been obtained.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 556, 1 April 2014, Pages 128-136
Journal: Thin Solid Films - Volume 556, 1 April 2014, Pages 128-136
نویسندگان
Yang Yang, Yumeng Yang, Taiwen Fu, Juan Zhu, Jinpeng Fan, Zhao Zhang, Jianqing Zhang,