کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8035196 | 1518047 | 2014 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Importance of control of oxidant partial pressure on structural and electrical properties of Pr-oxide films
ترجمه فارسی عنوان
اهمیت کنترل فشار جزئی اکسیدان بر خواص ساختاری و الکتریکی فیلمهای پر اکسید
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
For formation of gate dielectrics with higher permittivity (higher-k) using rare-earth oxide thin film, we have investigated the effect of H2O partial pressure (PH2O) during the Pr-oxide film formation and annealing on the Pr valence states and the amorphous and crystalline phase structures of the Pr-oxide films. The amorphous structure of Pr-oxide is dominantly formed in the film formed by metal-organic chemical vapor deposition (MOCVD) at a low temperature of 300 °C. The decrease in PH2O during MOCVD leads to the formation of Pr2O3 (Pr3 +) composition compared with PrO2 (Pr4 +) composition. It achieves the increase in the permittivity of the Pr-oxide films. The PH2O value drastically changes the grain size of crystal Pr-oxide in the amorphous film, and the crystalline structure is identified to be hexagonal Pr2O3 without depending on the Pr-oxide composition in the amorphous region. The annealing of the Pr2O3 film in vacuum at 500 °C promotes the crystallization of the hexagonal Pr2O3 phase, although the annealing in N2 ambient forms cubic Pr2O3 phase.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 557, 30 April 2014, Pages 276-281
Journal: Thin Solid Films - Volume 557, 30 April 2014, Pages 276-281
نویسندگان
Kimihiko Kato, Mitsuo Sakashita, Wakana Takeuchi, Noriyuki Taoka, Osamu Nakatsuka, Shigeaki Zaima,