Nanostructured anodic-alumina-based dielectrics for high-frequency integral capacitors

► Nanostructured porous-alumina-based thin films prepared by anodizing. ► Tailored morphology, structure, chemical composition, and electric polarization behavior. ► Advanced characteristics of integral capacitors utilizing the films as dielectrics. ► Optimized capacitor performances in the range of 1 kHz-300 MHz.