کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8035990 | 1518059 | 2013 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Diagnostic of corrosion-erosion evolution for [Hf-Nitrides/V-Nitrides]n structures
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Diagnostic of corrosion-erosion evolution for [Hf-Nitrides/V-Nitrides]n structures Diagnostic of corrosion-erosion evolution for [Hf-Nitrides/V-Nitrides]n structures](/preview/png/8035990.png)
چکیده انگلیسی
HfN/VN multilayered systems were grown on 4140 steel substrates with the aim to improve their electrochemical behavior. The multilayered coatings were grown via reactive r.f. magnetron sputtering technique by systematically varying the bilayer period (Î) and the bilayer number (n) while maintaining constant the total coating thickness (~ 1.2 μm). The coatings were characterized by X-ray diffraction (XRD), and electron microscopy. The electrochemical properties were studied by Electrochemical Impedance Spectroscopy and Tafel curves. XRD results showed preferential growth in the face-centered cubic (111) crystal structure for [HfN/VN]n multilayered coatings. The maximum corrosion resistance was obtained for coatings with (Î) equal to 15 nm, corresponding to bilayer n = 80. Polarization resistance and corrosion rate was around 112.19 kΩ cm2 and 0.094*10â 3 mmy respectively; moreover, these multilayered system showed a decrease of 80% on mass loss due to the corrosive-erosive process, in relation to multilayered systems with n = 1 and Π= 1200. HfN/VN multilayers have been designed and deposited on Si (100) and AISI 4140 steel substrates with bilayer periods (Î) in a broad range, from nanometers to hundreds of nanometers to study the microstructural evolution and electrochemical progress with decreasing bilayer thickness.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 545, 31 October 2013, Pages 194-199
Journal: Thin Solid Films - Volume 545, 31 October 2013, Pages 194-199
نویسندگان
C. Escobar, M. Villarreal, J.C. Caicedo, W. Aperador, H.H. Caicedo, P. Prieto,