کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8036707 | 1518067 | 2013 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Mechanical behaviors of crust layer in high-dose ion implanted-photoresist (HDI-PR) upon exposure to atmospheric pressure oxygen plasma: A measuring “pop-in” point in nanoindentation
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Mechanical behaviors of crust layer in high-dose ion implanted-photoresist (HDI-PR) upon exposure to atmospheric pressure oxygen plasma: A measuring “pop-in” point in nanoindentation Mechanical behaviors of crust layer in high-dose ion implanted-photoresist (HDI-PR) upon exposure to atmospheric pressure oxygen plasma: A measuring “pop-in” point in nanoindentation](/preview/png/8036707.png)
چکیده انگلیسی
The use of existing processes for cleaning high-dose ion implanted-photoresist (HDI-PR) on semiconductor has some associated problems. When the PR surface is damaged by ion bombardment, its near surface changes to a hard layer called the crust layer. In this study, we suggest a nanoindentation-based method for measuring the “pop-in” point of force-depth graph of HDI-PR. It was observed that the thickness and load force of the crust layer decrease continually due to the atmospheric pressure plasma as the plasma treatment time increases from 0 to 120Â s. Further, the mechanical property such as hardness or elastic modulus of the HDI-PR has changed suddenly after a treatment time of 60Â s.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 537, 30 June 2013, Pages 208-211
Journal: Thin Solid Films - Volume 537, 30 June 2013, Pages 208-211
نویسندگان
Soo In Kim, Chang Woo Lee,