کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9812370 1518112 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Production solutions in excimer laser thin film crystallization
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Production solutions in excimer laser thin film crystallization
چکیده انگلیسی
Excimer laser crystallization of thin film amorphous silicon has become a key technology in manufacturing of high-resolution low-power consumption thin film transistor displays. Lambda Physik and its Beam Delivery Systems Department MicroLas are leading the efforts to develop complete laser-optical system solutions comprising uniformity, productivity and economic aspects of this UV-laser process. This paper will present latest achievements in high-power excimer laser and illuminator design to address the production requirements of thin film crystallization and will look at challenges to meet future requirements.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 487, Issues 1–2, 1 September 2005, Pages 85-88
نویسندگان
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