کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812609 | 1518116 | 2005 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Optical properties and deposition rate of sputtered Ta2O5 films deposited by ion-beam oxidation
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Optical properties and deposition rate of sputtered Ta2O5 films deposited by ion-beam oxidation Optical properties and deposition rate of sputtered Ta2O5 films deposited by ion-beam oxidation](/preview/png/9812609.png)
چکیده انگلیسی
Tantalum oxide films deposited by DC magnetron sputtering in the transition mode and ion-beam oxidation (IBO) at room temperature showed that the deposition rate of the IBO film was four times higher than that obtained by conventional reactive magnetron sputtering, and was correlated with the oxygen ratio, XO2=O2/(O2+Ar), in the ion beam. The results of Rutherford backscattering and X-ray photoelectron spectroscopy indicated that the films deposited by IBO with various ion energy had the same composition and chemical bonding; the refractive index changed with the ion energy. The Fourier transform infrared absorption spectra indicated that the films deposited by IBO had excellent moisture-resistant characteristics.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 483, Issues 1â2, 1 July 2005, Pages 130-135
Journal: Thin Solid Films - Volume 483, Issues 1â2, 1 July 2005, Pages 130-135
نویسندگان
Cheng-Chung Lee, Der-Jun Jan,