a-Si/SiOx Bragg-reflectors on micro-structured InP

a-Si/SiOx Bragg-reflectors for the wavelength region from 500 nm to 830 nm with a low number of pairs were grown on cylindrical half-pipes on InP substrates using plasma-enhanced chemical vapor deposition with regard to applications for the confinement of the optical modes in micro-resonators. The optical properties of the Bragg-reflectors were determined by the new method of detection-focal spatially resolved spectroscopic ellipsometry in combination with the confocal micro-reflection technique.