کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812654 | 1518116 | 2005 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of Argon ion irradiation on grain orientation in platinum thin films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effect of Argon ion irradiation on grain orientation in platinum thin films Effect of Argon ion irradiation on grain orientation in platinum thin films](/preview/png/9812654.png)
چکیده انگلیسی
Platinum thin films were prepared on Mo/Si(100) substrate by Argon ion beam assisted deposition. X-ray diffraction analysis showed that the crystal orientation in Pt film was influenced by the incidence angle of the Ar+ beam. The films exhibited preferred (111) orientation without concurrent ion beam bombardment. The films, which were deposited with simultaneous bombardment by a 500 eV Ar+ beam along normal direction, showed mixed (111) and (200) orientation. Tilting the Ar+ beam off the normal direction of the film surface, the film exhibited highly preferred (111) orientation, even at the tilting angle of 45°. The results suggested that the surface free energy of (111) plane is much lower than that of other lattice planes and dominates during the film growing.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 483, Issues 1â2, 1 July 2005, Pages 411-415
Journal: Thin Solid Films - Volume 483, Issues 1â2, 1 July 2005, Pages 411-415
نویسندگان
B.J. Jiang, J. Jiang, C.X. Ren, X.H. Liu, X. Wang, T. Feng, Z.X. Zhang, Z.T. Song, L.P. Zheng,