کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9812685 1518117 2005 11 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Comparative study of the structure of a-CNx and a-CNx:H films using NEXAFS, XPS and FT-IR analysis
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Comparative study of the structure of a-CNx and a-CNx:H films using NEXAFS, XPS and FT-IR analysis
چکیده انگلیسی
The combination of both characterizations FT-IR and NEXAFS may leave the controversy about the interpretation of the XPS spectra, and allows a fine analysis of the evolution of the local structure as a function of nitrogen incorporation, according to the hydrogen concentration into the films. Fundamental differences can be revealed between hydrogenated and hydrogen-free carbon nitride: in the former, hydrogen promotes double bonds CNH, whereas in the latter nitrogen atoms prefer to substitute to carbon or interconnect aromatic rings through single bonds (>CN). A strong conjugation of imines (NCNH) for PECVD film and nitrile (NCN) groups for hydrogen-free films is evidenced.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 482, Issues 1–2, 22 June 2005, Pages 156-166
نویسندگان
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