کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9812773 1518120 2005 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Electrochemical deposition and characterization of wide band semiconductor ZnO thin film
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Electrochemical deposition and characterization of wide band semiconductor ZnO thin film
چکیده انگلیسی
ZnO thin film was electrodeposited from an aqueous solution of Zn(NO3)2 at 65 °C on indium tin oxide (ITO)-covered glass substrates. Atomic force microscope and X-ray diffraction studies indicated that the obtained ZnO films were polycrystalline with hexagonal wurtzite-type structure. Various operating conditions were controlled, including the applied voltages, the deposition time and annealing treatment. According to applied conditions, ZnO films presented different morphologies, grain size ranging approximately from 180 to 320 nm. When depositions were carried out at −0.9 and −1.0 V, ZnO films were compact and homogeneous, and their transmittance was close to 95% at the wavelength of 500 nm. The variations in the band gap of ZnO films deposited under different conditions are also discussed.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 478, Issues 1–2, 1 May 2005, Pages 25-29
نویسندگان
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