کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
9813036 1518124 2005 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Dielectric characteristics and thermal stability of Ba6−3xNd8+2xTi18O54 thin films prepared by pulsed laser deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Dielectric characteristics and thermal stability of Ba6−3xNd8+2xTi18O54 thin films prepared by pulsed laser deposition
چکیده انگلیسی
Ba6−3xNd8+2xTi18O54 with x=0.25 (simply BNT) dielectric thin films with a thickness of 320 nm have been prepared by pulsed laser deposition. The analysis results of X-ray diffraction showed that the as-deposited BNT films are amorphous, and the amorphous state is stable against a postannealing at temperature up to 850 °C. The dielectric constant of the BNT films has been determined to be about 80 with a low loss tan δ of about 0.006 at 1 MHz. The frequency dependence of the capacitance-voltage characteristics of BNT metal-insulator-metal capacitors is investigated. With the frequency increasing, the BNT capacitors showed gradually enhanced capacitor nonlinearity, which can be attributed to the Pt/BNT interface traps.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 472, Issues 1–2, 24 January 2005, Pages 208-211
نویسندگان
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