RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition
Keywords: 61.10.-I; 52.77.âj; 81.15.Gh; 61.10.âi; 79.60.âi; 68.55.âa; 52.80.Pi; Y2O3; MOCVD; XPS; RF plasma;