Keywords: ک. بالا; Composite materials; Low voltage; OFET; Sol-gel preparation; High k; Pentacene;
مقالات ISI ک. بالا (ترجمه نشده)
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در صورتی که به ترجمه آماده هر یک از مقالات زیر نیاز داشته باشید، می توانید سفارش دهید تا مترجمان با تجربه این مجموعه در اسرع وقت آن را برای شما ترجمه نمایند.
Keywords: ک. بالا; High k; Annealing treatment; Resistive switching; Conduction mechanism
Effect of DC/AC stress on the reliability of cell capacitor in DRAM
Keywords: ک. بالا; DRAM; High K; Cell capacitor; Leakage current; Retention time;
Co-60 gamma irradiation effects on electrical characteristics of HfO2 MOSFETs and specification of basic radiation- induced degradation mechanism
Keywords: ک. بالا; Hafnium Oxide (HfO2); High k; Irradiation effect; Gamma-ray; Radiation- induced degradation; Charge trapping mechanism;
Single-crystal atomic layer deposited Y2O3 on GaAs(0Â 0Â 1) - growth, structural, and electrical characterization
Keywords: ک. بالا; Rare earth oxide; Single crystal; High k; III-V materails; ALD; GaAs(0Â 0Â 1);
Study of the La-related dipole in TiN/LaOx/HfSiON/SiON/Si gate stacks using hard X-ray photoelectron spectroscopy and backside medium energy ion scattering
Keywords: ک. بالا; High K; Hafnium silicate; Lanthanum; MEIS; HAXPES; Electric dipole;
The effect of La2O3-incorporation in HfO2 dielectrics on Ge substrate by atomic layer deposition
Keywords: ک. بالا; High k; Germanate; La2O3; HfO2; Atomic layer deposition; Bilayer; Doping; LaGeOx; La(iprCp)3;
High dielectric permittivity impact on SOI Double-Gate Mosfet
Keywords: ک. بالا; SOI-DGMOSFET; Tunnel current; Quantum effects; Quantum-drift-diffusion; Local Fermi level; High k;
Surface atoms core-level shifts in single crystal GaAs surfaces: Interactions with trimethylaluminum and water prepared by atomic layer deposition
Keywords: ک. بالا; GaAs; Trimethylaluminum; High K; Atomic layer deposition; Synchrotron radiation photoemission;
Improvement of the electrical properties of TiO2-doped Bi5Nb3O15 thin films by the addition of MnO2
Keywords: ک. بالا; Dielectrics; Thin film; Pulsed laser deposition; High k; Doping; Leakage current density
Atomic layer deposited TiO2 for implantable brain-chip interfacing devices
Keywords: ک. بالا; ALD TiO2; High k; Neurochip; Biocompatibility
High K nanocomposite dielectric for printed organic electronics applications
Keywords: ک. بالا; Organic electronics; High K; Nanocomposite; Printed electronics; Pad printing; Barium titanate
Electrical characterisation of HfYO MIM-structures deposited by ALD
Keywords: ک. بالا; Yttrium; Doping; HfO2; Y2O3; ALD; MIM; High k
Improved self-gain in deep submicrometer strained silicon–germanium pMOSFETs with HfSiOx/TiSiN gate stacks
Keywords: ک. بالا; Compressively strained SiGe; High K; Metal gates; Mixed-signal; Self-gain
Structure and property changes of ZrO2/Al2O3/ZrO2 laminate induced by low-temperature NH3 annealing applicable to metal–insulator–metal capacitor
Keywords: ک. بالا; ZrO2; Al2O3; Dielectric; Phase change; DRAM capacitor; Metal-insulator-metal capacitor; Nitridation; High k
Hf–O–N and HfO2 barrier layers for Hf–Ti–O gate dielectric thin films
Keywords: ک. بالا; Dielectrics; High k; UV; Capacitance; Leakage
High pass filter with above IC integrated SrTiO3 high K MIM capacitors
Keywords: ک. بالا; Above IC; Ferroelectric; CMOS integration; Strontium titanate; MIM capacitors; High K;
Characterization of high and low k dielectrica using low-energy Time of Flight Elastic Recoil Detection
Keywords: ک. بالا; ERDA; RBS; low k; high k;
Effects of deposition temperature on the microstructural and electrical properties of praseodymium oxide-based films
Keywords: ک. بالا; Praseodymium oxide; High k; Dielectric; MOCVD;
Effects of the thermal annealing processes on praseodymium oxide based films grown on silicon substrates
Keywords: ک. بالا; Praseodymium oxide; MOCVD; High k; Dielectric; Thermal stability;