Optical properties of thin films of mixed Ni-W oxide made by reactive DC magnetron sputtering

Thin films of NixW1 − x oxides with x = 0.05, 0.19, 0.43 and 0.90 were studied. Films with thicknesses in the range 125-250 nm were deposited on silicon wafers at room temperature by reactive DC magnetron co-sputtering from targets of Ni and W. The films were characterized with X-ray diffraction (XRD), scanning electron microscopy (SEM), and spectroscopic ellipsometry (SE). XRD spectra and SEM micrographs showed that all films were amorphous and possessed a columnar structure. The ellipsometric angles Ψ and Δ of as-deposited films were measured by a rotating analyzer ellipsometer in the UV-visible-near infrared range (0.63-6.18 eV) and by an infrared Fourier transform rotating compensator ellipsometer in the 500-5200 cm−1 wavenumber range. SE measurements were performed at angles of incidence of from 50 ° to 70 °. Parametric models were used to extract thicknesses of the thin films and overlayers of NixW1 − x oxide at different compositions, band gaps and optical constants. Features in the optical spectra of the NixW1 − x oxides were compared with previous data on tungsten oxide, nickel oxide and nickel tungstate.