Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications

• Electrodeposition of polycrystalline UO2 thin films
• Tower-like morphology for 3D solar cell applications
• Novel technique for separation of heavy elements from radioactive waste streams

Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films.