کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1665346 1518036 2014 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Lattice strain induced phase selection and epitaxial relaxation in crystalline GeTe thin film
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
Lattice strain induced phase selection and epitaxial relaxation in crystalline GeTe thin film
چکیده انگلیسی


• Lattice-match dependence in crystalline GeTe growth
• The epitaxial relaxation induced by slight misfit strain
• Crystalline GeTe is ferroelectric.
• The local structure evolution during crystalline GeTe phase transition

We report that the lattice strain induced phase selection and epitaxial relaxation in crystalline GeTe thin films by pulsed laser deposition. The single-crystal substrates of MgO and BaF2 are designed to match the lattice of low-temperature α-GeTe phase and high-temperature β-GeTe phase, respectively. The structures of deposited GeTe films show lattice-match dependence rather than temperature dependence. Raman analysis indicates that the α-GeTe to β-GeTe ferroelectric phase transition accompanies an increase of local six-coordinated Ge atoms, which is analogous to the phase transition from amorphous to crystalline for memory application.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 568, 1 October 2014, Pages 70–73
نویسندگان
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